ASML today introduced a dual-stage ArF (193nm) lithography system for 300mm processing with 100nm resolution. The Veldhoven, Netherlands-based company is billing the AT:1100 ArF System as an industry ...
Hosted on MSN
China developing critical chipmaking supply chains — photoresist ecosystem emerges for ArF and KrF lasers
High-purity photoresists are essential for making chips on advanced production nodes. As China strides to build a self-sufficient semiconductor industry, it has to develop not only sophisticated ...
In anticipation of Semicon West, Nikon Precision Inc. (NPI) has publicly unveiled its fourth-generation lens-based 193nm scanner, the S306C, an argon fluoride scanner that incorporates a 0.78 ...
Princeton Instruments/Acton, the world s leading provider of high-end optics and optical coatings, continues to push the boundaries of technology with the new ExciLife-193, high durability, 193nm ...
ASML today introduced a dual-stage ArF (193nm) lithography system for 300mm processingwith 100nm resolution. The Veldhoven, Netherlands-based company is billing the AT:1100 ArFSystem as an industry ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback